NAME

SIGN

PURITY

GRANULARITY

SPECIFIC SURFACE AREA(m/g)

Aluminum Nitride

AlN

99.1%

D50:50nm

115m2/g

Aluminum Oxide

Al2O3

99.9%

D50:20nm

25m2/g

Antimony Doped Tin Oxide

ATO

99.99%

D50:20-50nm

45m2/g

Cerium Oxide

CeO2

99.5%

D50:10-30nm

96.7m2/g

Erbium Oxide

Er2O3

99.9%

D50:30-50nm

30-60m2/g

Europium Oxide

Eu2O3

99.999%

D50:80-100nm

30-40m2/g

Gadolinium Oxide

Gd2O3

99.9%

D50:40-60nm

30-55m2/g

Indium Oxide +Tin Oxide

ITO

99.99%

D50:30-100nm

*

Magnesium Oxide

MgO

99.9%

D50:40

50m2/g

Neodymium Oxide

Nd2O3

99.95%

D50:40-80nm

30-50m2/g

Praseodymium Oxide

Pr6O11

99.5%

D50:40-80nm

*

Samarium Oxide

Sm2O3

99.95%

D50:40-80nm

*

Silicon Nitride (whisker)

Si3N4 

99.0%

D50:20nm

115m2/g

Silicon Nitride (Amorphous)

α-Si3N4

99.0%

100/800nm

45m2/g

Beta-Silicon Carbide

β-Sic

99.0%

D50:50nm

90m2/g

Silicon Dioxide

SiO2

99%, 99.5%

D50:10nm

600m2/g

Titanium Carbide

TiC

99.0%

D50:20nm

120m2/g

Titanium Nitride

TiN

97%

D50:20nm

120m2/g

Titanium Dioxide

TiO2

99.99%

D50:5nm

120m2/g

Yttrium Oxide

Y2O3

99.999%

D50:30-70nm

30-50m2/g

Zirconium Carbide

ZrC

97%

D50:60nm

70m2/g

Zirconium Oxide

ZrO2

99.9%

D50:20nm

25m2/g

Zinc Oxide

ZnO

99.6%

D50:20

90m2/g

Nanometer Material

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